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NOTE: Recording and PDF slides will NOT be available after the talk
Artificial Intelligence and Machine Learning are quickly changing the world we live in. Whether you’re a Stanford student writing an essay and finding inspiration in ChatGPT, a Silicon Valley business owner using Google Ads to extend your reach into your customer base, a Mayo Clinic physician trying to diagnose a life-threatening case with complicated weird symptoms, a Creative Director in Hollywood, a Venture Capital investor on Sand Hill Road, or an IC designer at nVidia, your life has changed dramatically over the last few years due to the advent of AI and Machine Learning. None of this would have been possible without the explosive growth in computational power available to train these AI’s, and none of that would have been possible without todays nano-scale integrated circuits.
In this seminar, Tony and Ronald will take you on a journey into the world of nanolithography. They will start with a short review of the physics that is fundamental to optical patterning formation at the nanometer scale. Then they will present a brief the history of EUV lithography. Next, they will provide a few vignettes into modules that make up the EUV scanners, appropriately often described as the most complex engineering systems that mankind has ever designed. The final presentation part of the seminar will provide an outlook into the future of EUV lithography. The seminar will wrap-up with an opportunity for questions and hopefully exciting discussion.
Ronald Goossens was born and raised in the Netherlands. During his Master’s at Utrecht University, he worked with computer modeling of nucleosynthesis in stellar interiors and the impact on stellar evolution. This became the start of a life-long love affair with modeling and simulation of complex physical and chemical processes. During his years with Phillips Research, Stanford University, National Semiconductor, and NXP Semiconductor he worked on modeling of electron transport in transistors, of analog circuit behavior, and of system-level digital designs. For the last 20 years, he has worked at ASML on Computational Lithography with emphasis on control applications in semiconductor manufacturing. In early 2022, Ronald retired from full-time work. Currently, he “fills his time” as a part-time Senior Strategy Manager for ASML, as Adjunct Professor of Nanolithography at Purdue University, as a Board Member of the Boys & Girls Club of Silicon Valley, and as an avid outdoor photographer.
Anthony (Tony) Yen is Vice President and Head of the Technology Development Center at ASML, leading a global organization to work on identifying mid- and long-term technological directions in semiconductors and accompanying patterning solutions in close collaboration with other organizations within ASML, imec, and universities. He also teaches EUV lithography as a Professor at the College of Semiconductor Research, National Tsing Hua University. Tony received his BSEE degree from Purdue University and his SM, EE, PhD, and MBA degrees from MIT. From 1991 to 1997, he was a Member of the Technical Staff at Texas Instruments. From 1997 to 2003 and again from 2006 to 2017, he was with TSMC where he led the development of its lithography processes and the development of EUV lithography, including its mask technology, for high-volume manufacturing. Tony has over 110 publications and 150 US patents on nanolithography. He is a Fellow of the IEEE and a Distinguished Lecturer of the IEEE Electron Device Society, and a Fellow of SPIE and a recipient of its Frits Zernike Award for Microlithography. He is also a recipient of the Outstanding Electrical and Computer Engineer Award from Purdue and co-leads Purdue's Semiconductor Degrees Leadership Board. He serves on the Industrial Advisory Committee of the United States Department of Commerce.
